Nalamasu's Research Played Major Role in Enabling the Microelctronics Revolution

Troy, N.Y. - Omkaram "Om" Nalamasu, director of Rensselaer Polytechnic Institute's Center for Integrated Electronics, has been selected to receive the prestigious Roy W. Tess Award in Coatings for 2004 from the American Chemical Society's Division of Polymeric Materials: Science and Engineering (PMSE). The award is presented annually in recognition of outstanding contributions to coatings science and technology.

In announcing the award this week, PMSE noted that Nalamasu's pioneering contributions to optical lithography and photoresist materials have played a major role in enabling the microelectronics revolution.

Nalamasu is recognized as one of the world's leading experts in the areas of optical lithography and photoresist materials science and technology. He developed key concepts related to the Chemically Amplified Photoresist (CAMP) process and novel resist materials and processes. Nalamasu applied his research to the implementation of both 248 nm (nanometer) and 193 nm (nanometer) photoresist technologies. Applications for his work include computer chip fabrication.

"Professor Nalamasu is a recognized leader in microelectronics and nanoelectronics. His work is fundamental for next generation computing and communication devices. His vision and strategic direction are taking Rensselaer's program to new heights," said Arthur C. Sanderson, vice president of research at Rensselaer. "Professor Nalamasu has a track record of excellence. The Tess Award is yet another affirmation of his extraordinary work."

In 2003, Nalamasu received the NYSTAR (New York State Office of Science, Technology & Academic Research) Distinguished Professor Award consisting of a $1 million research grant. In 2000, he earned the American Chemical Society National Award for Team Innovation for the Invention and Innovation of 193 nm (nanometer) Resist Material. In 1998, he was a recipient of Japan's Photopolymer Science & Technology Award and was an invited speaker at the National Academy of Engineering's symposium on the "Frontiers of Engineering." Additionally, in 1997, he and his technical team won an R&D 100 Award for Invention, Development and Commercialization of the first Deep-UV (ultraviolet) CAMP, which refers to the use of 248 nm wavelength light to pattern small features.

Nalamasu earned a doctorate in chemistry in 1986 from the University of British Columbia, a master's in chemistry from the University of Hyderabad, India, and a bachelor's degree from Osmania University in Hyderabad, India.

Award Presentation
Nalamasu will receive the Tess Award on Monday, August 23, 2004 during the 228th Meeting of the American Chemical Society in Philadelphia, Pa. An evening reception sponsored by Rensselaer and the PMSE Division will follow the award symposium.

About The Center for Integrated Electronics (CIE)
The Center for Integrated Electronics (CIE) at Rensselaer is a major research center with approximately $8.7 million of funded research annually. These programs include major activities in gigascale interconnect research, three-dimensional interconnect structures, materials properties and process modeling, wide-band-gap semiconductors and devices, terahertz devices and imaging systems, power electronic devices and systems, and biochips. The CIE also facilitates Rensselaer's leadership in national, multi-university and multi-organizational interconnect technology programs such as the Center for Advanced Interconnect Systems (CAIST), the Focus Center-NY, the Center for Broadband Data Transport Science and Technology, and the Center for Power Electronics — prestigious centers of excellence that acknowledge Rensselaer's preeminent position in electronics technology.

Fact Sheet

Omkaram Nalamasu
Director of the Center for Integrated Electronics
Professor of Materials Science and Engineering
Professor of Chemistry
Education:
Ph.D., Chemistry, University of British Columbia, Vancouver, Canada, 1986
M.S., Chemistry, University of Hyderabad, India, 1980
B.S., Chemistry and Biology, Osmania University, India, 1978

Focus Areas
Recognized as one of the world's leading experts in the areas of optical lithography and photoresist materials science and technology. His research in photoresist materials has played a major role in enabling the microelectronics revolution.

Primary research interests include nanotechnology, nanopatterning, electronic and photonic materials, and lithography.

Implementation of both 248 nm (nanometer) and 193 nm photoresist technologies fundamental for next-generation computing and communication devices.

Accomplishments
Helped extend the resolution capability of optical lithography to sub-100 nm (nanometer) by developing fundamental structure-property relationships of polymeric materials.

Developed key concepts related to the Chemically Amplified Photoresist technology and processes for computer chip fabrication. He and his technical team won an R&D 100 Award for the Invention, Development and Commercialization of the first Deep-UV CAMP.

Fostered the collaboration of universities, industry, and government by co-founding the New Jersey Nanotechnology Consortium in 2002 and now through his directorship of the Center for Integrated Electronics at Rensselaer Polytechnic Institute. His work is fundamental for next-generation computing and communication devices.

Recipient of numerous awards and honors including the 2004 Roy W. Tess Award in Coatings, the 2003 NYSTAR Distinguished Professor Award consisting of a $1 million research grant, the 2000 American Chemical Society National Award for Team Innovation for the Invention and Innovation of 193 nm (nanometer) Resist Material, Japanís Photopolymer Science & Technology Award in 1998, and a 1997 R&D 100 Award for Invention, Development and Commercialization of the first Deep-UV (ultraviolet) Chemically Amplified Photoresist.

Contact: Mary Cimo
Phone: (518) 687-7174
E-mail: cimom@rpi.edu